Measurement of Ion Energy Distribution and Deposition of Ti Thin Films Using ABPPS Technology on Glass Substrate

Ion energy distributions (IEDs) play an important role in material processes and thin film deposition. We developed a newly designed multistep pulsed power supply (modulator) for the asymmetric bipolar sputtering (ABPPS) technology studied effect of reverse bias voltage improving properties films through Ti Using ion analyzer, we confirmed IEDs relative intensity under modulator at substrate position. A dense plasma was generated near sputter target voltages above 300 V. Experiments were conducted by varying applied to duty cycle modulator. Our results demonstrate that in-house-built ABPPS system can be used clean sample surfaces without requiring additional sources or prepared using this have smoother surface than those conventional sputtering.